Image forming apparatus using amorphous silicon photoconductor
AssigneeKyocera Mita Corporation
InventorsChikara Ishihara, Ai Takagami
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Abstract
An image forming apparatus is provided with an image forming unit including an amorphous silicon photoconductor. The amorphous silicon photoconductor includes a base and a photosensitive layer provided on the base. The photosensitive layer includes a highly resistive layer, a charge-injection inhibition layer, a photoconductive layer and a surface protecting layer successively laminated on the base. The thickness of the highly resistive layer is in the range of 1 μm to 4 μm. The thickness of the photosensitive layer is in the range of 15 μm to 25 μm and the absolute value of a solid light potential of the photosensitive layer is in the range of 20 to 100 V.
Claims11
An image forming apparatus comprising an image forming unit provided with an amorphous silicon photoconductor, the amorphous silicon photoconductor includes
- a base and
- a photosensitive layer provided on the base,
- the photosensitive layer including:
- a highly resistive layer;
- a charge-injection inhibition layer;
- a photoconductive layer;
- and a surface protecting layer successively laminated on the base,
- wherein:
- the thickness of the highly resistive layer is in the range of 1 μm to 4 μm;
- the thickness of the photosensitive layer is in the range of 15 μm to 25 μm;
- and
- the absolute value of a solid light potential of the photosensitive layer is in the range of 20V to 100V.
Dependencies are inferred from the claim text.