Design support system,computer readable medium, semiconductor device designing method and semiconductor device manufacturing method

Abstract

A design support system which supports designing a semiconductor device is provided. The design support system includes a gate film information acquisition section and a maximum allowable antenna ratio setting section. The gate film information acquisition section acquires information on the thickness of the gate insulating film of a semiconductor device which has been designed. The gate insulating film thickness refers to a physical film thickness. The maximum allowable antenna ratio setting section sets maximum allowable antenna ratios for a gate electrode according to the film thickness information acquired by the gate film information acquisition section. Hence, a designer designing a semiconductor device can set concrete values when changing maximum allowable antenna ratios according to the thickness of the gate insulating film.

Dependencies are inferred from the claim text.