Method of forming an embedded silicon carbon epitaxial layer
AssigneeApplied Materials, Inc.
InventorsJohn Boland, Zhiyuan Ye, Yihwan Kim
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Abstract
Methods for forming embedded epitaxial layers containing silicon and carbon are disclosed. Specific embodiments pertain to the formation embedded epitaxial layers containing silicon and carbon on silicon wafers. In specific embodiments an epitaxial layer of silicon and carbon is non-selectively formed on a substrate or silicon wafer, portions of this layer are removed to expose the underlying substrate or silicon wafer, and an epitaxial layer containing silicon is formed on the exposed substrate or silicon wafers. In specific embodiments, gates are formed on the resulting silicon-containing epitaxial layers.
Claims18
A process for forming embedded silicon carbon epitaxy layer on a substrate comprising:
- placing a substrate into a process chamber;
- non-selectively depositing a silicon carbon epitaxial layer on the substrate by exposing the substrate to deposition gas comprising a silicon source, a carbon source and a carrier gas;
- removing portions of the silicon carbon layer to form well regions in the silicon carbon layer which expose a portion of the substrate;
- depositing a silicon-containing epitaxial layer in the well regions on the exposed portion of the substrate;
- and
- forming one or more gates over the well regions on the silicon-containing epitaxial layer.
A process for forming an embedded silicon carbon epitaxy layer on a silicon wafer comprising:
- placing a silicon wafer into a process chamber;
- non-selectively depositing a silicon carbon epitaxial layer on the silicon wafer by exposing the substrate to deposition gas comprising a silicon source, a carbon source and a carrier gas;
- providing well regions by etching portions of the silicon carbon layer to expose the silicon wafer;
- depositing a silicon-containing epitaxial layer in the well regions and on the exposed silicon wafer;
- and
- forming one or more gates on the silicon-containing epitaxial layer.
Dependencies are inferred from the claim text.