Method for manufacturing solar cell
AssigneeSeiko Epson Corporation
InventorsYoshiharu AJIKI, Hideki TANAKA
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Abstract
A method for manufacturing a solar cell having a single crystal silicon substrate and an amorphous silicon layer provided at least on one side surface of the single crystal silicon substrate is provided. The method includes the steps of: (a) forming an intrinsic amorphous silicon layer by coating a first liquid containing silicon atoms on one surface of the single crystal silicon substrate, and sintering the first liquid coated; and (b) forming an impure amorphous silicon layer on the intrinsic amorphous silicon layer.
Claims7
A method for manufacturing a solar cell having a single crystal silicon substrate and an amorphous silicon layer provided at least on one side surface of the single crystal silicon substrate, the method comprising the steps of:
- (a) forming an intrinsic amorphous silicon layer by coating a first liquid containing silicon atoms on one surface of the single crystal silicon substrate, and sintering the first liquid coated;
- and
- (b) forming an impure amorphous silicon layer on the intrinsic amorphous silicon layer.
Dependencies are inferred from the claim text.