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US 2009/0215156 A1Published application
Method for Fabricating Nanogap and Nanogap Sensor
AssigneeMicobiomed. Co. Ltd.
InventorsBong hyun Chung, Sang kyu Kim, Hye Jung Park
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Abstract
The present invention relates to a method of fabricating a nanogap and a nanogap sensor, and to a nanogap and a nanogap sensor fabricated using the method. The present invention relates to a method of fabricating a nanogap and a nanogap sensor, which can be realized by an anisotropic etching using a semiconductor manufacturing process. According to the method of present invention, the nanogap and nanogap sensor can be simply and cheaply produced in large quantities.
Claims42
A method of forming a nanogap, comprising:
- anisotropically etching a substrate.
Dependencies are inferred from the claim text.