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US 2009/0214980 A1Published application
Melts
AssigneeRohm and Haas Electronic Materials LLC
InventorsEdgardo Anzures, Robert K. Barr
Life of this patent
Estimating the term…
Abstract
A light-attenuating composition and method of using it are described. The light-attenuating composition may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the light-attenuating composition. The light-attenuating composition attenuates light in at least the UV range and is water-soluble or water-dispersible.
Claims9
1-10. (canceled)
A composition consisting of one or more dyes for attenuating light in the UV range, visible range or UV and visible ranges;
- one or more water soluble or water dispersible compounds having a formula:
- R18—(OR19)n(OR20)p(OR21)q—R22 (V)
- where R18 is linear or branched —(C1-C100)-alkyl;
- R22 is hydroxyl;
- R19, R20 and R21 are independently linear or branched —(C1-C10)-aliphatic;
- and n is an integer of 1 to 100, p is an integer of 0 to 100 and q is an integer of 0 to 100;
- and one or more antioxidants.
4 more elements
A method comprising:
- a) depositing a photoresist on a metal containing substrate;
- b) selectively depositing a masking composition on the photoresist by ink jetting to form a composite, the masking composition comprises of one or more dyes for attenuating light in the UV range, visible range or UV and visible ranges and one or more water soluble or water dispersible compounds chosen from:
- R12-R13—(OR13)n(OR16)p(OR17)q—R14 (IV)
- where R13 is linear or branched —(C1-C10)-aliphatic, R12 and R14 are independently hydroxyl or —(C1-C20)-alkoxy;
- R16 and R17 are independently a linear or branched —(C1-C10)-aliphatic, and
- R18—(OR19)n(OR20)p(OR21)q—R22 (V)
- where R18 is a linear or branched —(C1-C100)-alkyl;
- R22 is hydroxyl;
- R19, R20 and R21 are independently linear or branched —(C1-C10)-aliphatic;
- and n is an integer of 1 to 100, p is an integer of 0 to 100 and q is an integer of 0 to 100;
- c) applying actinic radiation to the composite;
- and
- d) applying a developer to the composite to remove portions of the photoresist which were not covered by the masking composition to form a pattern of channels on the metal containing substrate, or applying a developer to the composite to remove the masking composition and portions of the photoresist covered by the masking composition to form a pattern of channels on the metal containing substrate.
10 more elements
A method comprising:
- a) depositing a photoresist having a cover sheet on a metal containing substrate;
- b) selectively depositing a masking composition on the cover sheet of the photoresist by ink jetting to form a composite, the masking composition comprises of one or more dyes for attenuating light in at least the UV range, the visible range or the UV and visible range and one or more water soluble or water dispersible compounds chosen from:
- R12-R13—(OR13)n(OR16)p(OR17)q—R14 (IV)
- where R13 is linear or branched —(C1-C10)-aliphatic, R12 and R14 are independently hydroxyl or —(C1-C20)-alkoxy;
- R16 and R17 are independently a linear or branched —(C1-C10)-aliphatic, and
- R18—(OR19)n(OR20)p(OR21)q—R22 (V)
- where R18 is a linear or branched —(C1-C100)-alkyl;
- R22 is hydroxyl;
- R19, R20 and R21 are independently linear or branched —(C1-C10)-aliphatic;
- and n is an integer of 1 to 100, p is an integer of 0 to 100 and q is an integer of 0 to 100;
- c) applying actinic radiation to the composite;
- d) peeling the cover sheet with the masking composition from the photoresist;
- and
- e) applying a developer to the photoresist to remove portions of the photoresist which were not covered by the masking composition to form a pattern of channels on the metal containing substrate, or applying a developer to the photoresist to remove portions of the photoresist covered by the masking composition to form a pattern of channels on the metal containing substrate.
11 more elements
Dependencies are inferred from the claim text.