Multi-station deposition apparatus and method
AssigneeApplied Materials, Inc.
InventorsMei Chang, Lawrence C. Lei, Walter B. Glenn
Life of this patent
Estimating the term…
Abstract
A multi-station deposition apparatus capable of simultaneous processing multiple substrates using a plurality of stations, where a gas curtain separates the stations. The apparatus further comprises a multi-station platen that supports a plurality of wafers and rotates the wafers into specific deposition positions at which deposition gases are supplied to the wafers. The deposition gases may be supplied to the wafer through single zone or multi-zone gas dispensing nozzles.
Claims19
A method of depositing a material on a wafer comprising:
- positioning a first wafer in a first deposition position within a vacuum deposition chamber;
- introducing a first deposition gas proximate the first wafer, the first deposition gas provided by flowing the first deposition gas in a first direction;
- flowing a separation gas in a second direction that is different than the first direction between the first deposition position and a second deposition position within the vacuum deposition chamber;
- moving the first wafer to the second deposition;
- and
- introducing a second deposition gas proximate the first wafer.
A method of depositing a material on a wafer comprising:
- introducing a first deposition gas proximate a wafer disposed a first deposition position within a vacuum deposition chamber, the vacuum deposition chamber having a second deposition position disposed adjacent the first deposition position;
- introducing a first deposition gas proximate the wafer while positioned;
- providing a first gas curtain between the first deposition position and a second deposition position within the vacuum deposition chamber;
- and
- moving the wafer to the second deposition while maintaining a relative position between the first gas curtain and the wafer.
An apparatus for depositing material on a wafer, comprising:
- a vacuum deposition chamber;
- a substrate support adapted for supporting a substrate in at least a first deposition position and a second deposition position within the vacuum deposition chamber;
- a plurality of gas curtain distributors disposed within the vacuum deposition chamber, a first gas curtain distributor fixed in a position relative to the substrate support;
- and
- a gas dispensing system, disposed within the vacuum deposition chamber and having one or more gas dispensing nozzles aligned with the first deposition position and a second deposition position.
Dependencies are inferred from the claim text.