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AssigneeLeybold Optics GmbH
InventorsAlfons Zoller, Hans Dirk Wolf, Christopher Schmitt, Michael Boos, Werner Klug
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The invention concerns an optical monitoring system for the measurement of layer thicknesses of thin coatings applied in a vacuum, particularly on moving substrates, during the coating process, in which the light intensity of the light of a light source injected into a reference light guide and released by a first piezoelectric or electrostrictive or magnetostrictive light chopper is registered by a light detector unit in a reference phase, the light of the light source in a measuring phase is injected into a first measuring light guide and the light released by a second piezoelectric or electrostrictive or magnetostrictive light chopper is directed to the substrate, and the light intensity of the light reflected or transmitted from the substrate is registered by the light detector unit through a second measuring light guide, and a remaining light intensity is registered by the light detector unit in at least one dark phase, wherein the reference phase, the measuring phase, and the dark phase are shifted in time by the light chopper and are digitally adjusted depending on the position of the substrate.
An optical monitoring system, particularly for the measurement of layer thicknesses of coatings applied to substrates (2) during the coating process, comprising at least
The optical monitoring system according to one of the above-mentioned claims, wherein the light detector unit (15) has a signal amplifier (19) and an A/D converter (20).
The optical monitoring system according to one of the above-mentioned claims, wherein the first and second light choppers (10, 11) are connected with a processor unit (21) for the generation of a measuring phase, a reference phase, and at least one dark phase.
The optical monitoring system according to one of the above-mentioned claims, wherein the light detector unit (15) is connected with the processor unit (21).
The optical monitoring system according to one of the above-mentioned claims, wherein a rotation mechanism (4) of a revolving substrate carrier (3) is connected or can be connected with the processor unit (21) for the registration of the rotating movement of the substrate (2) arranged on the substrate carrier (3).
An optical monitoring system for the measurement of layer thicknesses of coatings applied on at least one substrate (2) during the coating process, by which the substrate (2) or substrates (2) are arranged on a radius of a revolving substrate carrier (3) comprising at least
A process for the measurement of layer thicknesses of steamed or dusted coatings on moving substrates, especially revolving about an axis, during the coating process, in which
Dependencies are inferred from the claim text.