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US 2009/0214689 A1Published application
Imprint Lithography Templates Having Alignment Marks
AssigneeBoard of Regents, The University of Texas System
InventorsTodd C. Bailey, Stephen C. Johnson, Matthew E. Colburn, Byung-Jin Choi, Britain J. Smith, Carlton G. Willson, Sidlgata V. Sreenivasan, John G. Ekerdt
Life of this patent
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Abstract
One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template.
Claims20
An imprint template for imprint lithography that comprises:
- alignment marks embedded in an embedding material included in bulk material of the imprint template, wherein the embedding material surrounds the alignment marks.
An imprint template for imprint lithography that comprises:
- alignment marks embedded in an embedding material included in bulk material of the imprint template, wherein said embedding material surrounds said alignment marks, with said bulk material being transparent to radiation having a predetermined wavelength and said alignment marks being are spaced one or more predetermined distances from a surface of the imprint template.
A method for fabricating an imprint template for imprint lithography that comprises steps of:
- depositing a mask on an imprint template;
- etching alignment features through the mask into the imprint template;
- depositing alignment marks into the alignment features;
- over covering the alignment marks with a same material used to fabricate the imprint template;
- and
- removing the mask.
3 more elements
Dependencies are inferred from the claim text.