US 2009/0214400 A1 · PLASMA PROCESSING APPARATUS

Abstract

Provided is a plasma processing apparatus capable of generating a uniform plasma by preventing a nonuniformity of a current flow in a slot antenna. A dielectric plate is disposed to close a top opening of a plate cover and a slot antenna for generating plasma is disposed on the dielectric plate. By allowing an outer periphery of the slot antenna to make direct contact with an inner wall portion of the plate cover by using a conductive member having elasticity, when a microwave is supplied to slot antenna, it is possible to make an electrical resistance between the inner wall portion of the processing vessel and the outer periphery of the flat plate antenna substantially the same at any point in the entire circumference of the processing vessel, so that magnitude of the microwave current flowing in the slot antenna can be made approximately the same.

Claims7

Dependent claims

A plasma processing apparatus comprising:

a processing vessel which has a top opening and is made of metal;
a dielectric plate disposed to close the top opening of the processing vessel;
a microwave supply source of which ground side is connected with the processing vessel, for supplying a microwave;
a flat plate antenna which is disposed on the dielectric plate, for supplying the microwave from the microwave supply source to an inside of the processing vessel by transmitting it through the dielectric plate and generating plasma inside the processing vessel;
and
a conductive member which makes direct contact with an inner wall portion of the processing vessel and an outer periphery portion of the flat plate antenna.

3 more elements

Dependencies are inferred from the claim text.

Plasma processing apparatus

Life of this patent

Plasma processing apparatus

Life of this patent

Abstract

Claims7