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US 2009/0214398 A1Published application
Waste liquid processing device
AssigneeSeiko Epson Corporation
InventorsShinji HIRATA, Toshio KUMAGAI
Life of this patent
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Abstract
A waste liquid processing device includes: a waste liquid tank to which a liquid to be hardened by radiation of an energy ray is introduced as a waste liquid; a radiation unit which radiates the energy ray for hardening the waste liquid to the waste liquid introduced to the waste liquid tank; and a buffer tank which temporarily stores the waste liquid in a non-hardened state between a waste liquid discharging source and the waste liquid tank and which intermittently introduces the stored waste liquid to the waste liquid tank.
Claims8
A waste liquid processing device comprising:
- a waste liquid tank to which a liquid to be hardened by radiation of an energy ray is introduced as a waste liquid;
- a radiation unit which radiates the energy ray for hardening the waste liquid to the waste liquid introduced to the waste liquid tank;
- and
- a buffer tank which temporarily stores the waste liquid in a non-hardened state between a waste liquid discharging source and the waste liquid tank and which introduces the stored waste liquid to the waste liquid tank.
1 more element
Dependencies are inferred from the claim text.