Optical method for the characterization of laterally-patterned samples in integrated circuits
AssigneeBrown University Research Foundation
InventorHamphrey J. Maris
Life of this patent
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Abstract
Disclosed is a method for characterizing a sample having a structure disposed on or within the sample, comprising the steps of applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in the sample, applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample, sensing from a reflection of the second pulse a change: in optical response of the sample, and relating a time of occurrence of the change in optical response to at least one dimension of the structure.
Claims21
1-62. (canceled)
A method comprising:
- applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in a sample, where the sample comprises a plurality of structures disposed on or within the sample;
- applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample;
- sensing from a reflection of the second pulse a change in optical response of the sample;
- and
- relating a time of occurrence of the change in optical response to at least one dimension of the structure,
- where relating comprises:
- applying a beam of light to the surface so that the beam of light generates a diffracted beam of light;
- determining at least one characteristic of the diffracted beam of light;
- and
- calculating a repeat distance of the plurality of structures based at least in part on the at least one characteristic of the diffracted beam of light.
A system comprising:
- an optical source unit configured to apply a first pulse of light to a surface of a sample for creating a propagating strain pulse in the sample, and to apply a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample, where the sample comprises a plurality of structures disposed on or within the sample;
- where the optical source unit is further configured to apply a beam of light to the surface to generate a diffracted beam of light;
- a sensor configured to sense a reflection of the second pulse a change in optical response of the sample;
- and
- a processor configured to relate a time of occurrence of the change in optical response to at least one dimension of the structure,
- where the processor is further configured to determine at least one characteristic of the diffracted beam of light and calculate a repeat distance of the plurality of structures based at least in part on the determined at least one characteristic of the diffracted beam of light.
A non-destructive system comprising:
- a first pulse applying means for applying a first pulse of light to a surface of a sample for creating a propagating strain pulse in the sample, where the sample comprises a plurality of structures disposed on or within the sample,
- a second pulse applying means for applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample;
- a beam applying means for applying a beam of light to the surface to generate a diffracted beam of light;
- a sensing means for sensing from a reflection of the second pulse a change in optical response of the sample;
- and
- a relating means for relating a time of occurrence of the change in optical response to at least one dimension of the structure,
- where the relating means is further for determining at least one characteristic of the diffracted beam of light;
- and calculating a repeat distance of the plurality of structures based on the determined at least one characteristic of the diffracted beam of light.
Dependencies are inferred from the claim text.