Back to results
US 2009/0213357 A1Published application
Exposure apparatus and device manufacturing method
OwnerDai Araiinventor
Life of this patent
Estimating the term…
Loading patent…
Loading patent…
OwnerDai Araiinventor
Estimating the term…
An exposure apparatus equipped with a measurement stage that is provided with various measuring instruments disposed in a relationship wherein measurement accuracy is not lowered, and a device manufacturing method using the exposure apparatus are provided. An exposure apparatus according to the present invention is equipped with a measurement stage provided independent of a wafer stage that holds a wafer, On a measurement table (MTB) held on the upper face of this measurement stage, a reference plate (53) on which a first reference mark (FM1) being used for an aerial image measuring instrument and a second reference mark (FM2) for measuring the positional relationship of the wafer stage with respect to the projection image of the pattern of a reticle are formed is provided. This reference plate (53) and the aerial image measuring instrument are disposed adjacent to a reflection surface (51X) to which the beam from an X-axis interferometer is projected and a reflection surface (50) to which the beam from a Y-axis interferometer is projected.
An exposure apparatus that exposes a substrate mounted on a movable substrate stage with a pattern via a projection optical system, comprising:
An exposure apparatus that exposes a substrate mounted on a movable substrate stage with a pattern via a projection optical system, comprising:
An exposure apparatus that exposes a substrate mounted on a movable substrate stage with a pattern via a projection optical system, comprising:
Dependencies are inferred from the claim text.