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US 2009/0213353 A1Published application
Lithographic Apparatus and Device Manufacturing Method
AssigneeASML Netherlands B.V.
InventorsCheng-Qun Gui, Arno Jan Bleeker, Pieter Willem Herman De Jager
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Abstract
Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
Claims1
An apparatus comprising:
- (i) an array of individually controllable elements to receive and pattern a projection beam of radiation;
- and
- (ii) an array of focusing elements comprising at least two focus elements, each being optically associated with a separate group of the individually controllable elements;
- wherein each of the individually controllable elements can be set to at least two states in which a corresponding portion of the patterned projection beam provides radiation at an intensity between the at least two states.
1 more element
Dependencies are inferred from the claim text.