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US 2009/0213352 A1Published application
Method for improving the imaging properties of an optical system, and such an optical system
AssigneeCarl Zeiss SMT GmbH
InventorAksel Goehnermeier
Life of this patent
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Abstract
The disclosure relates to a method for improving the imaging properties of an optical system, such as a projection objective for microlithography. The disclosure also relates to an optical system, such as a projection objective for microlithography.
Claims32
A method, comprising:
- providing an optical system that comprises at least one optical correction arrangement comprising a plurality of optical correction elements which, at least locally, define an optical axis and which are provided with aspheric surface contours which add together overall at least approximately to zero, the at least one correction arrangement being in the vicinity of a pupil plane of the optical system;
- and
- displacing at least one of the correction elements relative to at least one of the other optical correction elements at least with a directional component in a direction of the optical axis to set a desired corrective action of the correction arrangement,
- wherein the optical system is configured to be used as a projection objective in microlithography.
1 more element
An optical system, comprising:
- at least one optical correction arrangement that comprises a plurality of optical correction elements which, at least locally, define an optical axis and which are provided with aspheric surface contours which add together overall at least approximately to zero, at least one of the correction elements being assigned at least one manipulator to be capable of displacing the correction element relative to at least one of the remaining correction elements at least with a directional component in the direction of the optical axis,
- wherein the at least one correction arrangement is arranged at least in the vicinity of a pupil plane of the optical system, and the optical system is a projection objective configured to be used in microlithography.
An optical system comprising:
- a plurality of optical elements, at least two of the plurality of optical elements having complementary surface contours,
- wherein:
- the at least two of the plurality of optical elements are configured so that, during use of the optical system, the at least two of the plurality of optical elements correct imaging errors having a Zernike order higher than 5 present at an image plane of the optical system;
- and
- the optical system is configured to be used in microlithography.
2 more elements
Dependencies are inferred from the claim text.