Immersion lithography using hafnium-based nanoparticles

An apparatus comprising:

• a light source;
• a platform for supporting a work piece;
• a lens element positioned between the light source and the platform;
• and
• a composition of matter positioned between the lens element and the platform, the composition of matter comprising:
• a first medium;
• and
• first Hafnium dioxide nanoparticles incorporated in the first medium, the first Hafnium dioxide nanoparticles having a diameter less than or equal to about 15 nanometers.

A method for immersion lithography comprising:

• providing a light source;
• providing a lens element between the light source and a work piece;
• providing a composition of matter between the lens element and the work piece, the composition of matter comprising:
• a first medium;
• and
• first Hafnium dioxide nanoparticles incorporated in the first medium, the first Hafnium dioxide nanoparticles having a diameter less than or equal to about 15 nanometers;
• and
• exposing the work piece to light provided by the light source by passing light from the light source through the lens element and the composition of matter to the work piece.