Microlithography exposure apparatus using polarized light and microlithography projection system having concave primary and secondary mirrors
OwnerHans-Juergen Manninventor
Life of this patent
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Abstract
The present invention relates to a microlithography projection exposure apparatus for wavelengths ≦100 nm, in particular for EUV lithography using wavelengths <50 nm, preferably <20 nm having an illumination system which illuminates a field in an object plane using light of a defined polarization state and an objective which projects the field in the object plane into an image plane, the polarized light passing through the objective from the object plane to the image plane.
Claims35
A microlithography projection exposure apparatus comprising:
- an illumination system configured to illuminate a field in an object plane using light of a defined polarization state, and
- a projection system, having at least a first mirror a second mirror, a third mirror, and a fourth mirror,
- wherein:
- the projection system is configured to project the field in the object plane into an image in an image plane,
- the light of the defined polarized state can pass through the projection system from the object plane to the image plane,
- the projection system has an image-side numerical aperture NA of at least 0.3, and
- the defined polarization state is selected in such way that essentially s-polarized light is provided in the image plane.
(canceled)
A microlithography projection system configured to project an object in an object plane into an image in an image plane, the microlithography projection system comprising:
- a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, a sixth mirror, a seventh mirror, and a eighth mirror, the first, second, third, fourth, fifth, sixth, seventh and eighth mirrors being situated in a light path from the object plane to the image plane,
- wherein the projection system has an unobscured exit pupil and wherein the first, second, third, fourth, fifth, sixth, seventh, and eight mirrors each have a volume claim and wherein all volume claims are extendable in a direction parallel to an axis of symmetry of the projection system, without intersecting the light path of the light propagating in the projection system from the object side to the image side.
A microlithography projection system configured to project an object in an object plane into an image in an image plane, the microlithography projection system comprising:
- a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, a sixth mirror, a seventh mirror, and a eighth mirror, the first, second, third, fourth, fifth, sixth, seventh and eighth mirrors being situated in a light path from the object plane to the image plane, wherein
- the projection system has a unobscured exit pupil and
- wherein the first, second, third, fourth, fifth, sixth, seventh, and eight mirrors each have a volume claim and wherein all volume claims are extendable in a direction parallel to an axis of symmetry of the projection system, without any volume claim of the other mirrors of the projection system.
A microlithography projection system configured to project an object in an object plane into an image in an image plane, the microlithography projection system comprising:
- at least a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, a sixth mirror, a seventh mirror, and a eighth mirror, which are the first, second, third, fourth, fifth, sixth, seventh and eighth mirrors being situated in a light path from the object plane to the image plane, wherein
- at least one of the first and second mirrors is a concave mirror, and each of the mirrors of the projection system is assigned a radius and an absolute value of the radius of all non planar mirrors of the projection system is less than 5000 mm.
Dependencies are inferred from the claim text.