Probe card, manufacturing method of probe card, semiconductor inspection apparatus and manufacturing method of semiconductor device
AssigneeRenesas Technology Corp.
InventorsSusumu KASUKABE, Yasunori Narizuka
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AssigneeRenesas Technology Corp.
InventorsSusumu KASUKABE, Yasunori Narizuka
Estimating the term…
A silicon substrate is used as a mold, and thin films such as metal films and polyimide films are sequentially stacked on the silicon substrate by using photolithography techniques, thereby forming a probe sheet having contact terminals having a pyramidal shape or a truncated pyramidal shape disposed at distal ends of cantilever beam structures. A fixing substrate is further fixed to the probe sheet, and then, the formed probe sheet is sequentially stacked and formed on the silicon substrate, the substrate is fixed, and the silicon substrate and predetermined polyimide films are removed by etching, thereby forming the group of contact terminals with the cantilever beam structures at a time.
A probe card comprising:
A probe card comprising:
A semiconductor inspection apparatus comprising:
Dependencies are inferred from the claim text.