Loading patent…
AssigneeAsml Netherlans B.V.
InventorsYvonne Wendela KRUIJT-STEGEMAN, Raymond Jacobus Knaapen, Johan Frederik Dijksman, Krassimir Todorov Krastev, Sander Frederik Wuister, Aleksey Yurievich Kolesnychenko, Karal Diederick Van Der Mast, Klaus Simon
Estimating the term…
An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
An imprint lithography apparatus comprising a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged to hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being imprinted after and interspersed between the patterns imprinted by the first array.
-21. (canceled)
An imprint lithography apparatus comprising:
An imprint lithography apparatus comprising an array of adjacent template holders, each template holder arranged to hold a template and to imprint a separate area on a same substrate, each template holder of the array of template holders having at least part of an alignment system.
An imprint lithography apparatus, comprising:
An imprint lithography method, comprising:
An imprint lithography method, comprising:
An imprint lithography method, comprising:
An imprint lithography method, comprising:
An imprint lithography method, comprising:
An imprint lithography method, comprising:
Dependencies are inferred from the claim text.