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US 2009/0212449 A1Published application
Optical waveguide substrate manufacturing method
AssigneeNGK Insulators, Ltd.
InventorTakashi YOSHINO
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Abstract
A voltage is applied on an interdigitated electrode provided on one main face of a single-domain ferroelectric single crystal substrate to form a periodic domain inversion structure 9. The interdigitated electrode is then removed. The optical waveguide 20 is then formed in the substrate 18. An optical intensity center P1 of the optical waveguide is kept away from a location P0 of the end of the interdigitated electrode.
Claims6
A method of producing an optical waveguide substrate comprising a channel optical waveguide with a periodic domain inversion structure formed therein, the method comprising the steps of:
- applying a voltage on an interdigitated electrode provided on one main face of a single-domain ferroelectric single crystal substrate to form a periodic domain inversion structure;
- removing the interdigitated electrode;
- and
- forming the optical waveguide in the ferroelectric single crystal substrate,
- wherein a projected location P2 of an optical intensity center P1 of the optical waveguide on the one main face is kept away from a projected location P0 of the end of the interdigitated electrode on the one main face.
2 more elements
Dependencies are inferred from the claim text.