Back to results
US 2009/0212239 A1Published application
Charged particle beam apparatus
AssigneeSII NanoTechnology Inc.
InventorMasayuki Maruo
Life of this patent
Estimating the term…
Abstract
An assist gas having a very small amount and a uniform concentration is fed by a charged particle beam apparatus, in which a supply amount of gas is intermittently fed by a massflow controller, and gas is passed through a diffusion mechanism connected to the massflow controller, whereby an assist gas having a very small amount and a uniform concentration.
Claims6
A charged particle beam apparatus comprising:
- a charged particle beam lens barrel configured to irradiate a charged particle beam;
- a gas nozzle configured to feed gas near a position on a sample at which a charged particle beam is irradiated;
- and
- a gas supply amount adjusting device configured to control a flow rate of gas between a gas supply source and the gas nozzle,
- wherein the gas supply amount adjusting device intermittently feeds gas to the gas nozzle side.
2 more elements
Dependencies are inferred from the claim text.