Magnetic recording media having five element alloy deposited using pulsed direct current sputtering

A method of making magnetic recording medium, comprising:

• providing a substrate for depositing layers;
• depositing a first layer comprising Cr over said substrate;
• depositing a second layer over said first layer, said second layer made of a material selected from the group consisting of CrW, CrMo, and CrTi;
• depositing a third layer over said second layer, said third layer made of a material selected from the group consisting of CoCr, CoCTa, and CoCrRu;
• and
• depositing a fourth layer over said third layer using pulsed direct current sputtering, said fourth layer made of a five element alloy comprising CoCrPtB-X where X is the fifth element;
• and
• depositing a fifth layer comprising of a high magnetic moment saturation alloy.

A method of making magnetic recording medium, comprising:

• providing a substrate for depositing layers;
• depositing a first layer comprising Cr over said substrate;
• depositing a second layer over said first layer, said second layer made of a material selected from the group consisting of CrW, CrMo, and CrTi;
• depositing a third layer over said second layer, said third layer made of a material selected from the group consisting of CoCr, CoCrTa, and CoCrRu;
• and
• depositing a fourth layer over said third layer using pulsed direct current sputtering, said fourth layer made of a five element alloy comprising CoCrPtB-X where X is the fifth element, and said pulsed direct current sputtering having a pulse frequency ranging from 50 KHz to 150 KHz, a reverse time ranging from 0.5 microseconds and 5 microseconds, and a duty cycle ranging from 50% to 100%;
• and
• depositing a fifth layer comprising of a high magnetic moment saturation alloy.

A method of making magnetic recording medium, comprising:

• providing a substrate for depositing layers;
• depositing a first layer comprising Cr over said substrate;
• depositing a second layer over said first layer, said second layer made of a material selected from the group consisting of CrW, CrMo, and CTi;
• depositing a third layer over said second layer, said third layer made of a material selected from the group consisting of CoCr, CoCrTa, and CoCrRu;
• and
• depositing a fourth layer over said third layer using pulsed direct current sputtering, said fourth layer made of a five element alloy selected from the group consisting of CoCrPtBTa, CoCrPtBNb, and CoCrPBHf, and said pulsed direct current sputtering having a pulse frequency ranging from 50 KHz to 150 KHz, a reverse time ranging from 0.5 microseconds and 5 microseconds, and a duty cycle ranging from 50% to 100%;
• and
• depositing a fifth layer comprising of a high magnetic moment saturation alloy directly on said fourth layer.