Rheological fluids for particle removal
AssigneeMicron Technology, Inc.
InventorNishant Sinha
Life of this patent
Estimating the term…
Abstract
Methods and apparatus for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing electrorheological (ER) and magnetorheological (MR) fluids to remove contaminant residual particles from the substrate surface are provided.
Claims33
A method for cleaning a surface of a substrate, comprising:
- applying a rheological fluid having a fluid consistency onto the substrate;
- applying a field to increase viscosity of the rheological fluid to a semi-solid consistency;
- decreasing the field to decrease the viscosity of the rheological fluid;
- and
- removing the Theological fluid from the substrate.
A method for cleaning a surface of a substrate having contaminant particulates thereon, comprising:
- applying a Theological fluid having a fluid consistency onto the substrate;
- applying a field to increase viscosity of the rheological fluid to a semi-solid consistency to loosen the contaminant particulates from the surface of the substrate;
- decreasing the field wherein said loosened contaminant particles are suspended in the rheological fluid;
- and
- removing the rheological fluid and said loosened contaminant particles from the substrate.
A method for cleaning a surface of a substrate having particulates thereon, comprising:
- applying a rheological fluid having a fluid consistency onto the substrate;
- applying a field to increase viscosity of the rheological fluid to a semi-solid consistency;
- repeatedly decreasing and increasing the field to repeatedly vary the viscosity of the rheological fluid from a fluid to up to a semi-solid consistency wherein at least a portion of the particulates are suspended within the rheological fluid;
- and
- removing the Theological fluid and said particulates from the substrate.
A method for cleaning a surface of a substrate, comprising:
- applying an electrorheological fluid to the surface of the substrate having particulates thereon;
- applying an electrical field to increase viscosity of the electrorheological fluid to a semi-solid consistency such that the particulates are suspended therein;
- and
- decreasing the electrical field such the electrorheological fluid is a fluid consistency;
- and
- removing the electrorheological fluid from the substrate.
A method for cleaning a surface of a substrate, comprising:
- applying an magnetorheological fluid to the surface of the substrate having particulates thereon;
- applying a magnetic field to increase viscosity of the magnetorheological fluid to a semi-solid consistency such that the particulates are suspended therein;
- and
- decreasing the magnetic field such the magnetorheological fluid is a fluid consistency;
- and
- removing the magnetorheological fluid from the substrate.
An apparatus for cleaning a surface of a substrate, comprising:
- a vessel for receiving and containing an electrorheological fluid therein;
- a field generator situated proximally to the vessel such that the field can be generated to a fluid contained within the vessel;
- and
- a support for a substrate situated within the vessel.
A semiconductor substrate having a surface with structures situated thereon, and a Theological fluid in contact with the surface and said structures.
Dependencies are inferred from the claim text.