Gas injection unit and thin film deposition apparatus having the same
AssigneesJusung Engineering Co., Ltd., Ads
InventorsChang Jae LEE, Young Ho KWON
Life of this patent
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Abstract
A gas injection unit and a thin film deposition apparatus having the gas injection unit are provided. Since a variety of different kinds of organic materials can be sequentially vaporized and injected by a single injection unit, a variety of different kinds of thin films can be deposited in a single chamber. Furthermore, the gas injection structure of the injector unit can be easily controlled. Therefore, even when the process conditions such as the size of the substrate, the process temperature of the chamber, and the like are altered, it becomes possible to actively response to the altered process conditions by simply replacing some parts without replacing the whole injector unit.
Claims19
A gas injection unit comprising:
- a supplying tube unit having a plurality of supplying tubes to which different materials are supplied;
- and
- an injector unit connected to the supplying tube unit, and provided with a passage communicating with the supplying tubes and one or more injection holes communicating with the passage and injecting gas,
- wherein at least one heat transferring member is provided on the passage.
A gas injection unit comprising:
- a supplying tube unit having a supplying tube to which a deposition material is supplied;
- and
- an injector unit connected to the supplying tube unit and provided with a passage communicating with the supplying tube and one or more injection holes communicating with the passage and injecting gas,
- wherein the injector unit comprises an upper body and a lower body coupled to the upper body, and the upper and lower bodies are formed of different materials having different thermal expansion coefficients.
A gas injection unit comprising:
- a supplying tube unit having a supplying tube to which a deposition material is supplied.
- an injector unit connected to the supplying tube unit and provided with a passage communicating with the supplying tube and one or more injection holes communicating with the passage and injecting gas;
- and
- a deformation control plate which is coupled to one surface of the injection unit on which the injection holes are formed and, formed of metal having a different thermal expansion coefficient from the injector unit.
A thin film deposition apparatus comprising:
- a chamber providing a depositing space;
- a substrate supporting base disposed in the chamber and configured to support a substrate;
- and
- a gas injection unit disposed facing the substrate supporting unit,
- wherein the gas injection unit comprises:
- a supplying tube unit having a supplying tube to which a deposition material is supplied;
- and
- an injector unit connected to the supplying tube unit and provided with a passage communicating with the supplying tube and one or more injection holes communicating with the passage and injecting gas,
- wherein at least one heat transferring member is provided on the passage.
Dependencies are inferred from the claim text.