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US 2009/0156852 A1Published application
Organometallic compounds
AssigneeRohm and Haas Electronic Materials LLC
InventorsDeodatta Vinayak Shenai-Khatkhate, Michael Brendan Power
Life of this patent
Estimating the term…
Abstract
Organometallic compounds suitable for use as vapor phase deposition precursors for Group IV metal-containing films are provided. Methods of depositing Group IV metal-containing films using certain organometallic precursors are also provided. Such Group IV metal-containing films are particularly useful in the manufacture of electronic devices.
Claims7
1-6. (canceled)
A compound of formula IIA or IIB:
- wherein R1 and R2 are independently chosen from alkyl, alkenyl, alkynyl or aryl;
- each R3 is independently chosen from (C1-C12)alkyl, alkenyl, alkynyl and aryl;
- each R4 is independently chosen from branched and cyclic (C3-C5)alkyl;
- each R5 is independently chosen from (C1-C12)alkyl, alkenyl, alkynyl and aryl;
- X is halogen;
- a′=0-3;
- b′=0-2;
- c′=1-3;
- d′=0-3;
- a′+b′+c′+d′=4;
- a″=0-2;
- b″=0-2;
- e″=1-2;
- f″=0-2;
- a″+b″+e″+f″=4;
- wherein at least two of a″, b″ and f″≠0;
- provided when a″=1, e″=1, f″=2, and R4=(CH3)C that R5≠CH3;
- and provided that R3 is branched or cyclic (C3-C5)alkyl when c′+d′=4.
15 more elements
(canceled)
Dependencies are inferred from the claim text.