Inorganic sintered material containing photocatalyst covered with silicon oxide film
AssigneeMitsui Chemicals, Inc.
InventorsNobuhiko Horiuchi, Takashi Nabeta, Satoru Miyazoe, Hiroshi Suizu, Toru Nonami
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Abstract
The present invention is to provide an inorganic sintered material that excels in photocatalytic activity as compared with that exhibited in the use of a photocatalyst of titanium oxide only. It is provided an inorganic sintered material comprising a photocatalyst, wherein the photocatalyst comprising a base having photocatalytic activity; and a silicon oxide film covering the base, wherein the film is substantially pore-free, and wherein the photocatalyst has a alkali metal content of not less than 1 ppm but not more than 1,000 ppm.
Claims28
An inorganic sintered material comprising a photocatalyst, wherein the photocatalyst comprising:
- a base having photocatalytic activity;
- and
- a silicon oxide film covering the base, wherein the film is substantially pore-free, and
- wherein the photocatalyst has a alkali metal content of not less than 1 ppm but not more than 1,000 ppm.
A method for producing pottery having a photocatalyst-containing surface layer on its surface, wherein the photocatalyst comprising a base having photocatalytic activity and a silicon oxide film covering the base, wherein the film is substantially pore-free, wherein the method comprising the following steps (A), (B) and (C):
- (A) mixing at least any one combination of an aqueous medium containing the base and a silicate, an aqueous medium containing a silicate and the base, and an aqueous medium containing the base and an aqueous medium containing a silicate, and coating the base with the silicon oxide film;
- (B) separating the photocatalyst composed of the silicon oxide film and the base covered with the silicon oxide film from the aqueous medium, and drying and/or calcining the resulted material;
- and
- (C) attaching the photocatalyst covered with said silicon oxide film to a surface of unglazed pottery and subsequently firing the resulting material at a temperature of not less than 600 degree centigrade but not more than 1,500 degree centigrade;
- and
- wherein the pH of a mixed solution containing both the base and a silicate in step (A) is maintained at 5 or less.
A method for producing pottery having a photocatalyst-containing surface layer on its surface, wherein the photocatalyst comprising a base having photocatalytic activity and a silicon oxide film covering the base, wherein the film is substantially pore-free, wherein the method comprising the following steps (A), (B) and (C) or (A), (B) and (D):
- (A) mixing at least any one combination of an aqueous medium containing the base and a silicate, an aqueous medium containing a silicate and the base, and an aqueous medium containing the base and an aqueous medium containing a silicate, and coating the base with the silicon oxide film;
- (B) separating the photocatalyst composed of the silicon oxide film and the base covered with the silicon oxide film from the aqueous medium, and drying and/or calcining the resulting material;
- and
- (C) attaching the photocatalyst covered with said silicon oxide film to a surface of the ceramic sintered material and subsequently firing the resulting material at a temperature of not less than 600 degree centigrade but not more than 1,500 degree centigrade;
- or
- (D) mixing the photocatalyst covered with said silicon oxide film with the raw material of said ceramic sintered material, molding the resulted mixture, and subsequently firing the resulting material at a temperature of not less than 600 degree centigrade but not more than 1,500 degree centigrade;
- and
- wherein the pH of a mixed solution containing both the base and a silicate in step (A) is maintained at 5 or less.
Dependencies are inferred from the claim text.