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US 2009/0156016 A1Published application
Method for transfer of a thin layer
AssigneeCommissariat a l'Energie Atomique
InventorLea Di Cioccio
Life of this patent
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Abstract
A method for transferring a thin layer from an initial substrate includes forming an assembly of the initial substrate with one face of a silicone type polymer layer, this face having been treated under an ultraviolet radiation, and processing the initial substrate to form the thin layer on the silicone type polymer layer.
Claims19
A preparation method for the transfer of a thin layer from an initial substrate, the method comprising the following steps:
- a) treating one face of a silicone type polymer layer by ultraviolet radiation, to transform the surface of the polymer into an oxide layer,
- b) directly bonding the initial substrate with the surface of the polymer layer, and
- c) processing the initial substrate to form the thin layer on the silicone type polymer layer.
Dependencies are inferred from the claim text.