Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods
OwnerSang-Jun Choi, Youn-Jin Cho +2inventors
InventorsSang-Jun Choi, Youn-Jin Cho, Seung-Wook Shin, Hye-Won Kim
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Abstract
An aromatic (meth)acrylate compound having an α-hydroxy, the aromatic (meth)acrylate compound being represented by the following Formula 1: In Formula 1, R1 is hydrogen or a methyl, R2 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, and carbon CAR is bonded directly to an aromatic ring of AR, R and R′ are independently hydrogen or an alkyl, and X is an integer ranging from 1 to 6.
Claims16
An aromatic (meth)acrylate compound having an α-hydroxy, the aromatic (meth)acrylate compound being represented by the following Formula 1:
- wherein, in Formula 1:
- R1 is hydrogen or a methyl,
- R2 is hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl,
- AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, and
- carbon CAR is bonded directly to an aromatic ring of AR,
- R and R′ are independently hydrogen or an alkyl, and
- X is an integer ranging from 1 to 6.
A photosensitive aromatic (meth)acrylate polymer, the photosensitive aromatic (meth)acrylate polymer including repeating units represented by Formulae 6a, 6b, and 6c:
- wherein, in Formulae 6a to 6c:
- R1 is hydrogen or a methyl,
- R2 is hydrogen, a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or combinations thereof,
- AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings,
- carbon CAR is bonded directly to an aromatic ring of AR,
- R and R′ are independently hydrogen or an alkyl,
- R5 and R7 are independently hydrogen or methyl,
- R6 is a C4 to C20 acid-labile group,
- R8 is a lactone-derived group,
- x is an integer ranging from 1 to 6, and
- p, q, and r are respectively mole ratios of the repeating units of Formulae 6a to 6c, p/(p+q+r) is about 0.2 to about 0.5, q/(p+q+r) is about 0.3 to about 0.5, and r/(p+q+r) is about 0.1 to about 0.4.
A method of patterning a material, the method comprising:
- forming a resist layer on the material;
- forming a resist pattern from the resist layer using a lithographic process;
- and
- patterning the material through the resist pattern, wherein:
- the resist layer includes a photosensitive aromatic (meth)acrylate polymer, the (meth)acrylate polymer including repeating units represented by Formulae 6a, 6b, and 6c:
- wherein, in Formulae 6a to 6c:
- R1 is hydrogen or a methyl,
- R2 is hydrogen, a substituted or unsubstituted alkyl, a substituted or unsubstituted aryl, or combinations thereof,
- AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings,
- carbon CAR is bonded directly to an aromatic ring of AR,
- R and R′ are independently hydrogen or an alkyl,
- R5 and R7 are independently hydrogen or methyl,
- R6 is a C4 to C20 acid-labile group,
- R8 is a lactone-derived group,
- x is an integer ranging from 1 to 6, and
- p, q, and r are respectively mole ratios of the repeating units of Formulae 6a to 6c, p/(p+q+r) is about 0.2 to about 0.5, q/(p+q+r) is about 0.3 to about 0.5, and r/(p+q+r) is about 0.1 to about 0.4.
Dependencies are inferred from the claim text.