Photosensitive compound and photoresist composition including the same

A photoresist composition comprising:

• (a) 1 to 85 weight % of a photosensitive compound having a structure selected from a group consisting of the following Formula 1a and Formula 1b,
• wherein, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R′ and R″ are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R′″ is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms;
• wherein, n, x, z, R, R′ R′″ and R′″ are the same defined as in Formula 1a, x′ is 1, 2, 3 or 4, z′ is 0, 1, 2 or 3, and p and m are independently 1 or 2;
• (b) 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound;
• and
• (c) 10 to 5000 weight parts of an organic solvent with respect to 100 weight parts of the photosensitive compound.

A method for forming a photoresist pattern, comprising the step of:

• a) coating a photoresist composition on a substrate to form a photoresist layer;
• b) exposing the photoresist layer to a light;
• c) heating the exposed photoresist layer;
• and
• d) developing the heated photoresist layer to form the photoresist pattern,
• wherein the photoresist composition comprises i) 1 to 85 weight % of a photosensitive compound having a structure selected from a group consisting of the following Formula 1a and Formula 1b,
• wherein, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R′ and R″ are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R′″ is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms;
• wherein, n, x, z, R, R′ R″ and R′″ are the same defined as in Formula 1a, x′ is 1, 2, 3 or 4, z′ is 0, 1, 2 or 3, and p and m are independently 1 or 2;
• (ii) 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound;
• and
• (iii) 10 to 5000 weight parts of an organic solvent with respect to 100 weight parts of the photosensitive compound.