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OwnerSang-Choll Han, Seung-Tae Oh +2inventors
InventorsSang-Choll Han, Seung-Tae Oh, Deok-Joo Kim, Matthias Henyk
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The present invention relates to a method of forming a nanopattern, and, more particularly, to a method of continuously forming a nanopattern in a large area and a method of forming a nanopattern on a substrate having a roll shape, and a substrate having a pattern formed using the method. A method of relatively moving a specimen having a large area and a light source of interfering light and a method of performing exposure through the relative axial movement of the light source of interfering light and the substrate having a roll shape while the substrate having a roll shape rotates are used to avoid the problems occurring in the related art, such as a large space required for the equipment during the formation of nanopatterns, a limited output of a laser, and a limited degree of freedom in patterns.
A method of forming patterns, the method comprising:
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A method of producing a stamper, the method comprising:
A method of forming patterns, the method comprising:
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A method of producing a stamper having a roll shape, the method comprising:
Dependencies are inferred from the claim text.