Process for producing monosilane

Abstract

The present invention relates to a plant and a process for the continuous production of monosilane and tetrachlorosilane by catalytic dismutation of trichlorosilane at an operating temperature and a pressure of from 1 to 50 bar abs. in a plant according to claim 1, in which—trichlorosilane (A) is preheated in a heat exchanger (7), and fed to the 10 countercurrent reactor (1) which is provided with catalyst (3),—product mixture formed in the countercurrent reactor (1) is at least partly condensed by means of the condenser (5) at a temperature in the range from −25 to 50° C. with the condensate flowing back into the countercurrent reactor (1),—the product phase which is not condensed in the condenser (5) is passed to the 15 condensation unit (8) which is operated at a temperature in the range from −40 to −110° C.,—the volatile product phase from the condensation unit (8) is fed to the distillation column (9) which is operated at a temperature in the range from −60 to −170° C. and monosilane (C) is discharged at the top of the distillation column (9), 20—the SiCl4-containing bottoms from the countercurrent reactor (1) are brought to a temperature in the range from 60 to 110° C. in the vaporizer unit (6) and—bottom product from the vaporizer (6) is conveyed via a heat exchanger (7) into the double wall (2) of the countercurrent reactor (1) and the SiCl4-containing product stream (B) is discharged at a level in the upper region of the reactor (1).

Dependencies are inferred from the claim text.