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AssigneeUniversity College Dublin, National University of Ireland, Dublin
InventorsFergal O'Reilly, Patrick Hayden, Gerard O'Sullivan, Padraig Dunne
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A system for providing extreme ultraviolet (EUV) radiation comprises a laser source arranged to produce a laser beam having a focus; and a carrier movable relative to the laser source for carrying a surface material, the surface material when carried by the carrier providing a renewable target edge. The focussed beam is arranged to impinge on the target edge to produce an EUV radiation emitting plasma. The system is cooperable with a mirror for harnessing the EUV radiation by reflecting EUV radiation impinging thereon. The mirror comprises a substantially aspheric surface and means for supplying a reflecting liquid to at least partially coat the aspheric surface, the mirror being rotatable to centrifugally confine the liquid to the aspheric surface.
1-67. (canceled)
A mirror for harnessing EUV radiation by reflecting EUV radiation impinging thereon, said mirror comprising a substantially aspheric surface and means for supplying an EUV reflecting liquid to at least partially coat said aspheric surface, said mirror being rotatable to confine said liquid to said aspheric surface by a combination of centrifugal force and liquid surface tension.
A system for providing extreme ultraviolet (EUV) radiation comprising:
Dependencies are inferred from the claim text.