Lithographic apparatus and method
AssigneeASML Netherlands B.V.
InventorsRemi Daniel Marie EDART, Franciscus Godefridus Casper Bijnen, Rudy Jan Maria Pellens, Pascale Anne Maury
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Abstract
A lithographic alignment apparatus includes a radiation source arranged to generate radiation at a wavelength of 1000 nanometers or longer, and a plurality of non-imaging detectors arranged to detect the radiation after the radiation has been reflected by an alignment mark.
Claims20
A lithographic alignment apparatus comprising a radiation source arranged to generate radiation at a wavelength longer than 1000 nanometers, and a plurality of non-imaging detectors arranged to detect the radiation after the radiation has been reflected by an alignment mark.
A method of aligning a substrate in a lithographic apparatus, the method comprising directing infrared radiation through at least part of substrate and onto an alignment mark, detecting infrared radiation reflected from the alignment mark using a non-imaging detector, and determining the position of the alignment mark using the detected infrared radiation.
Dependencies are inferred from the claim text.