Multiple chuck scanning stage

Abstract

A substrate processing system and method are disclosed. The system may include a stage, first and second chucks mounted on the stage and at least one processing head proximate the stage. The stage and processing head are configured for relative movement for a sufficient distance for the processing head to process both the first and second test substrates. According to the substrate processing method first and second substrates may be disposed on chucks mounted to a stage. The stage and a processing head may move relative to each other in a first direction along a first axis for a first distance that is sufficient for a substrate processing head to scan across the substrates, then move relative to each other along a direction nonparallel to the first direction for a second distance, and then move relative each other opposite the first direction for a distance sufficient for the head to scan across the substrates. The processing head may process the first and second substrates at one or more locations along the first distance and/or third distance.

Dependencies are inferred from the claim text.