Multi-domain liquid crystal display device and method for fabricating the same

13:

• A multi-domain liquid crystal display (LCD) device, comprising:
• a plurality of gate and data lines perpendicular to each other on a first substrate defining a plurality of pixel regions, each of the pixel regions divided into at least first and second domains, wherein the first and second domains are symmetric with respect to a virtual line which divides the pixel region into the first and second domains;
• a plurality of thin film transistors each at a crossing portion of the gate and data lines;
• an insulating layer within each of the pixel regions and having a plurality of first protrusions arranged along different directions in each of the first and second domains of the pixel regions, wherein each of the protrusions is formed as an elliptical shape having major-axes and minor-axes, and the major-axes of the protrusions within the first domain are disposed along a direction vertical to a direction of the major-axes of the protrusions within the second domain;
• a plurality of pixel electrodes on the insulating layer, each pixel electrode having a plurality of second protrusions corresponding to the first protrusions of the insulating layer;
• a second substrate having a black matrix layer and a color filter layer;
• and
• a liquid crystal layer between the first and second substrates.

37:

• A method for fabricating a multi-domain liquid crystal display (LCD) device, comprising the steps of:
• forming a plurality of gate and data lines perpendicular to each other on a first substrate to define a plurality of pixel regions, each of the pixel regions includes at least first and second domains, wherein the first and second domains are symmetric with respect to a virtual line which divides the pixel region into the first and second domains;
• forming a gate insulating layer along an entire surface of the substrate including the gate lines;
• forming a plurality of semiconductor layers on the gate insulating layer, each semiconductor layer disposed above a gate electrode corresponding to the gate lines;
• forming source and drain electrodes on each of the semiconductor layers, the source electrode extending from one of the data lines;
• forming an insulating layer on the first substrate;
• etching the insulating layer to form a plurality of first protrusions and to form a plurality of second protrusions, wherein each of the first and second protrusions is formed as an elliptical shape having major-axes and minor-axes, and the major-axes of the first protrusions within the first domain are disposed along a direction vertical to a direction of the major-axes of the second protrusions within the second domain;
• forming a plurality of pixel electrodes on the plurality of first protrusions and the plurality of second protrusions;
• forming a first alignment layer along an entire surface of the first substrate including the pixel electrodes;
• forming a black matrix layer and a color filter layer on a second substrate;
• attaching the first and second substrates together;
• and
• forming a liquid crystal layer between the first and second substrates.