Capacitor of semiconductor device and method for manufacturing the same

A method for manufacturing a capacitor of a semiconductor device, the method comprising:

• forming a first capacitor lower metal layer and a first capacitor insulating layer over a lower interlayer dielectric layer of a semiconductor substrate;
• forming a first capacitor upper metal layer over the first capacitor insulating layer, the first capacitor upper metal layer aligned so as to at least partially expose the first capacitor insulating layer;
• forming a first capping layer and an upper interlayer dielectric layer over the first capacitor insulating layer and the first capacitor upper metal layer;
• forming a second capacitor lower metal layer electrically coupled with the first capacitor upper metal layer through the upper interlayer dielectric layer and the first capping layer;
• forming a second capping layer over the upper interlayer dielectric layer and the second capacitor lower metal layer, the second capping layer including a hole aligned to at least partially expose the second capacitor lower metal layer;
• forming a pad aligned over the second capping layer and the hole, and electrically coupled with the second capacitor lower metal layer;
• forming a protective layer over the second capping layer and the pad;
• and
• forming a second capacitor upper metal layer over the second capping layer and extending through the protective layer, the second capacitor upper metal layer at least partially aligned with the second capacitor lower metal layer.