Indium tin oxide target, method for manufacturing the same, transparent conductive film of indium tin oxide, and method for manufacturing transparent conductive film of indium tin oxide

A method for manufacturing an indium tin oxide target, the method comprising:

• mixing at least one oxide powder selected from the group consisting of Sm2O3 powder and Yb2O3 powder with In2O3 powder and SnO2 powder to prepare a mixed powder;
• mixing and wet milling the mixed powder, a dispersing agent, and a dispersion medium to prepare a slurry;
• drying the slurry to prepare a granular powder;
• molding the granular powder to form a molded body;
• and
• sintering the molded body,
• wherein an amount of the oxide powder is about 0.5 to about 10 wt. % based on the weight of the mixed powder.

A method for manufacturing a transparent conductive film of an indium tin oxide, the method comprising:

• preparing an indium tin oxide target including at least one oxide selected from the group consisting of Sm2O3 and Yb2O3, an amount of the oxide being about 0.5 to about 10 wt. % based on the weight of the target;
• depositing an amorphous transparent film on a substrate using the target in a DC sputtering scheme;
• and
• etching the transparent film with a weak acid.