Process for self-aligned flare point and shield throat definition prior to main pole patterning

A method for manufacturing a magnetic write head comprising:

• providing a substrate;
• depositing a write pole material over the substrate;
• depositing a magnetic layer over the write pole material
• depositing a non-magnetic spacer layer over the magnetic layer;
• forming a first mask structure having an edge located a desired distance from an intended air bearing surface plane;
• performing a first ion milling to remove portions of the non-magnetic spacer layer and magnetic layer that are not protected by the first mask structure;
• removing the first mask structure;
• depositing a hard mask layer;
• depositing a CMP stop layer;
• forming a second mask structure, configured to define a write pole;
• performing a second ion milling to remove portions of the CMP stop layer, hard mask and write pole material that are not protected by the second mask structure, wherein shadowing from the magnetic layer and non-magnetic spacer layer cause an undermining resulting in a stepped flare structure;
• conformally depositing a non-magnetic side gap material;
• depositing a refill layer;
• performing a chemical mechanical polishing sufficiently to expose the CMP stop layer, and
• performing a reactive ion etching to remove the CMP stop layer.