Transparent optical film and method of forming the same
AssigneeSony Corporation
InventorsMikihiro Takemoto, Toshitaka Kawashima, Yoshihiro Oshima
Life of this patent
Estimating the term…
Abstract
A method of forming a transparent optical film includes the step of forming an optical film that is transparent on a substrate by a reactive sputtering process using a Mg—Si metal target in an atmosphere into which a gas of a fluorine-containing compound is introduced and in which the total pressure is adjusted to 8 Pa or more.
Claims5
A method of forming a transparent optical film, comprising the step of:
- forming an optical film that is transparent on a substrate by a reactive sputtering process using a Mg—Si metal target in an atmosphere into which a gas of a fluorine-containing compound is introduced and in which the total pressure is adjusted to 8 Pa or more.
A transparent optical film formed on a substrate by a reactive sputtering process using a Mg—Si metal target in an atmosphere into which a gas of a fluorine-containing compound is introduced and in which the total pressure is adjusted to 8 Pa or more.
Dependencies are inferred from the claim text.