Methods for transitioning a fluid meniscus to and from surfaces of a substrate

A method for processing a substrate, comprising:

• positioning a transition surface substantially coplanar to a substrate surface, the transition surface being adjacent to an edge of the substrate;
• and
• positioning a first proximity head over a second proximity head, such that a fluid meniscus is generated between the first proximity head and the second proximity head, the fluid meniscus generated by supplying fluids to each of the first and second proximity heads and simultaneously removing fluids from the first and second proximity heads, such that the fluid meniscus remains stable between the first and second proximity heads;
• and
• moving a fluid meniscus over the transition surface and onto the substrate surface, the first proximity head and the second proximity head placed at opposite sides of the transition surface and the substrate, such that when the first and second proximity heads are over the transition surface, the fluid meniscus is between the respective side of the transition surface and the first and second proximity heads, and when the first and second proximity heads are over the substrate, the fluid meniscus is between the respective side of the substrate and the first and second proximity heads;
• whereby the fluid meniscus is configured to move between the transition surface and the surface of the substrate, defining a time when the fluid meniscus moves between a gap defined between the transition surface and the substrate.