Rpsc and rf feedthrough

A remote plasma source, comprising:

• a metal containing source body having a first end, a second end, and a center portion coupled between the first end and the second end, the source body having an inner surface extending between the first end and the second end through the central portion;
• a conductive coaxial element extending within the source body and spaced from the inner surface;
• and
• a dielectric spacer coupled between the first end and the conductive coaxial element.

An apparatus, comprising:

• a processing chamber;
• a remote plasma source, the remote plasma source having a metal containing source body comprising a first end, a second end, and a central portion coupled therebetween, the source body having an inner surface, the second end coupled to ground, and the first end coupled with the processing chamber;
• an RF power source coupled to the first end of the remote plasma source;
• a microwave power source coupled with the remote plasma source;
• and
• a gas source coupled with the remote plasma source.