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US 2009/0151635 A1Published application
Adaptively Coupled Plasma Source Having Uniform Magnetic Field Distribution and Plasma Chamber Having the Same
OwnerNam Hun Kiminventor
Life of this patent
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Abstract
Disclosed is an adaptively coupled plasma source having a uniform magnetic field distribution. The adaptively coupled plasma source includes a flat plate shaped bushing disposed above a reaction chamber in a center region of the reaction chamber, a plurality of upper coils extended from the bushing to be disposed above the reaction chamber, so as to spirally surround the bushing, and a plurality of side coils arranged around a sidewall portion of the reaction chamber to surround the reaction chamber.
Claims8
An adaptively coupled plasma source comprising:
- a flat plate shaped bushing disposed above a reaction chamber in a center region of the reaction chamber;
- a plurality of upper coils extended from the bushing to be disposed above the reaction chamber, so as to spirally surround the bushing;
- and
- a plurality of side coils arranged around a sidewall portion of the reaction chamber to surround a periphery of the reaction chamber.
1 more element
A plasma chamber comprising:
- a chamber shell defining a reaction space for producing plasma therein;
- a flat plate shaped wafer support disposed in a lower region of the reaction space and adapted to support a wafer thereon;
- a lower radio frequency power source connected to the flat plate shaped wafer support;
- an adaptively coupled plasma source including:
- a flat plate shaped bushing disposed above the chamber shell in a center region of the chamber shell;
- a plurality of upper coils extended from the bushing to be disposed above the chamber shell, so as to spirally surround the bushing;
- and a plurality of side coils arranged around a sidewall portion of the chamber shell to surround the chamber shell;
- and
- an upper radio frequency power source connected to the bushing.
6 more elements
Dependencies are inferred from the claim text.