Tensioned aperture mask and method of mounting

Abstract

In a method of preparing and using an aperture mask, a temperature of an aperture mask is increased to a first, mounting temperature (T1), whereupon the size of the aperture mask increases according to its coefficient of thermal expansion (CTEam), until at least one dimension thereof is of a first desired extent. The temperature of a frame is also increased to T1, whereupon the size of the frame grows according to its coefficient of thermal expansion (CTEf), which is lower than CTEam. The aperture mask is fixedly mounted to the frame at T1. The frame mounted aperture mask is then used for depositing a material on a substrate at a deposition temperature T2 that is less than T1, whereupon the frame holds the shadow mask in tension with the one dimension at a second desired extent.

Dependencies are inferred from the claim text.