Apparatus for and method of processing substrate
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsAtsushi OSAWA, Yoshitaka Abiko
Life of this patent
Estimating the term…
Abstract
A substrate processing apparatus discharges a hydrofluoric acid solution from discharge nozzles toward grooves formed in side walls of an inner bath. The hydrofluoric acid solution discharged from the discharge nozzles impinges upon the grooves to diffuse, thereby moving toward a top portion of the inner bath in the form of low-speed uniform liquid flows. Thus, a metal component and foreign substances generated in the inner bath float up toward the top portion of the inner bath without being agitated within the inner bath, and are rapidly drained to an outer bath together with the hydrofluoric acid solution.
Claims15
A substrate processing apparatus for processing a substrate by dipping the substrate in a processing liquid, said substrate processing apparatus comprising:
- a processing bath having a side wall and a bottom wall for storing the processing liquid therein;
- a first discharge part for discharging the processing liquid toward one of said side wall and said bottom wall within said processing bath;
- a drainage part for draining the processing liquid overflowing from a top portion of said processing bath;
- and
- a lifter for moving the substrate upwardly and downwardly between the inside of said processing bath and a position over said processing bath.
A method of processing a substrate by dipping the substrate in a processing liquid, said method comprising the steps of:
- a) discharging the processing liquid toward one of a side wall and a bottom wall of a processing bath within said processing bath;
- and
- b) dipping the substrate in the processing liquid stored within said processing bath.
Dependencies are inferred from the claim text.