Skin cleansing composition
AssigneeKao Corporation
InventorsNaoko Yamamoto, Masaki Shimizu, Natsuko Toshida
Life of this patent
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AssigneeKao Corporation
InventorsNaoko Yamamoto, Masaki Shimizu, Natsuko Toshida
Estimating the term…
A skin cleansing composition contains, in addition to water, the following ingredients (A) to (D): (A) a polyoxyethylene alkylether sulfate, (B) an ether carboxylic acid-type surfactant, (C) an alkyl polyglycoside, and (D) one or more of a higher fatty acid and a higher alcohol. A total amount of the ingredients (A), (B) and (C) ranges from to 30 wt % based on the whole composition, with the ingredient (A) amounting to from 20 to 80 wt %, the ingredient (B) amounting to from 7 to 70 wt %, and the ingredient (C) amounting to from 7 to 70 wt %, the amount of the ingredient (D) ranges from 0.3 to 3 wt % based on the whole composition. A pH of the composition ranges from 4.5 to 7 when diluted to 5 wt % by weight with deionized water. The skin cleansing composition can produce abundant foam of fine and smooth quality without an increase in foam viscosity, and therefore, allows the body to be washed with comfort.
A skin cleansing composition comprising, in addition to water, the following ingredients (A) to (D):
Dependencies are inferred from the claim text.