Hybrid Chemical Vapor Deposition Process Combining Hot-Wire CVD and Plasma-Enhanced CVD

A thin film deposition chamber, comprising:

• a filament capable of being heated to 1500° C. or higher;
• an electrode to form and maintain a plasma for thin film deposition;
• and
• a substrate support member configured to permit movement of a substrate in a longitudinal direction.

A thin film deposition chamber, comprising:

• a plurality of plasma electrodes;
• a plurality of filaments configured to heat and decompose a vapor phase chemical;
• and
• a roller to permit movement of a substrate in a longitudinal direction.

A method for depositing a layer of a semiconductor-containing material on a substrate, the method comprising:

• providing the substrate in a reaction space;
• providing a gas in the reaction space, the gas including a semiconductor-containing chemical;
• forming plasma-excited species of the semiconductor-containing chemical in the reaction space;
• forming thermally-excited species of the semiconductor-containing chemical in the reaction space;
• and
• contacting the substrate with the plasma-excited species of the semiconductor-containing chemical and the thermally-excited species of the semiconductor-containing chemical while the substrate is moved from a first position to a second position in the reaction space.