Patterning a surface comprising silicon and carbon
AssigneeHitachi Global Storage Technologies Netherlands B.V.
InventorsCherngye Hwang, Dennis R. McKean, Gary J. Suzuki
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Abstract
Patterning a surface, comprising at least one feature having silicon coupled to a substrate, is described herein. In one embodiment a method is described for patterning a surface which comprises at least one feature having silicon and at least one feature having carbon coupled to a substrate. The surface is coated with 3-(trimethoxysilyl)propyl methacrylate, and a photoresist is applied the 3-(trimethoxysilyl)propyl methacrylate coated surface. The photoresist is imaged and the surface is etched. The photoresist is then removed.
Claims20
A method of patterning a surface, wherein said surface comprises at least one feature comprising silicon coupled to a substrate, comprising:
- coating said surface with 3-(trimethoxysilyl)propyl methacrylate;
- applying a photoresist to said 3-(trimethoxysilyl)propyl methacrylate coated surface;
- imaging said photoresist;
- etching said surface;
- and
- removing said photoresist.
A system for patterning a surface, wherein said surface comprises at least one feature having silicon and at least one feature having carbon coupled to a substrate, comprising:
- means for coating said surface with 3-(trimethoxysilyl)propyl methacrylate;
- means for applying a photoresist to said 3-(trimethoxysilyl)propyl methacrylate coated surface;
- means for imaging said photoresist;
- means for etching said surface;
- and
- means for removing said photoresist.
A method of patterning an air bearing surface, wherein said air bearing surface comprises at least one feature having silicon and at least one feature having carbon coupled to a slider, comprising:
- coating said air bearing surface with 3-(trimethoxysilyl)propyl methacrylate;
- applying a photoresist to said 3-(trimethoxysilyl)propyl methacrylate coated air bearing surface;
- imaging said photoresist;
- etching said air bearing surface;
- and
- removing said photoresist.
Dependencies are inferred from the claim text.