Novel compound, manufacturing method thereof, acid generator, resist composition and method of forming a resist pattern

A compound represented by a general formula (b1-1) shown below:

• (wherein, R1 represents an aryl group or alkyl group which may contain a substituent group;
• R3 represents a hydrogen atom or an alkyl group;
• n1 represents an integer of 0 or 1, and in the case that n1 is 1, R1 and R3 may mutually be bonded to form a ring with a 3- to 7-membered ring structure together with the carbon atom with which R1 is bonded and the carbon atom with which R3 is bonded;
• A represents a bivalent group which forms a ring with 3- to 7-membered ring structure together with the sulfur atom with which A is bonded, and the ring may contain a substituent group;
• R2 represents an aromatic group which may contain a substituent group, a linear or branched alkyl group of 1 to 10 carbon atoms which may contain a substituent group, or a linear or branched alkenyl group of 2 to 10 carbon atoms which may contain a substituent group;
• n represents an integer of 0 or 1;
• and Y1 represents an alkylene group of 1 to 4 carbon atoms in which hydrogen atoms may be substituted with fluorine atoms.).

A method of manufacturing a compound represented by a general formula (b1-1-1) shown below, which comprises the step of reacting a compound represented by a compound represented by a general formula (I) shown below, a compound represented by a general formula (II) shown below, and a copper catalyst, thereby obtaining the compound represented by the general formula (b1-1-1):

• (wherein, A represents a bivalent group which forms a ring with a 3- to 7-membered ring structure together with the sulfur atom with which A is bonded, and the ring may contain a substituent group;
• R2 represents an aromatic group which may contain a substituent group, a linear or branched alkyl group of 1 to 10 carbon atoms which may contain a substituent group, or a linear or branched alkenyl group of 2 to 10 carbon atoms which may contain a substituent group;
• n represents an integer of 0 or 1;
• Y1 represents an alkylene group of 1 to 4 carbon atoms in which hydrogen atoms may be substituted with fluorine atoms;
• and R1 each independently represents an aryl group or alkyl group which may contain a substituent group.)

A compound represented by a general formula (I) shown below:

• (wherein, R2 represents an aromatic group which may contain a substituent group, a linear or branched alkyl group of 1 to 10 carbon atoms which may contain a substituent group, or a linear or branched alkenyl group of 2 to 10 carbon atoms which may contain a substituent group;
• n represents an integer of 0 or 1;
• Y1 represents an alkylene group of 1 to 4 carbon atoms in which hydrogen atoms may be substituted with fluorine atoms;
• and R1 each independently represents an aryl group or alkyl group which may contain a substituent group.).

A method of manufacturing a compound represented by a general formula (I) shown below, which comprises the step of reacting a compound represented by a compound represented by a general formula (I-1) shown below, a compound represented by a general formula (I-2) shown below, thereby obtaining the compound represented by the general formula (I):

• (wherein, R2 represents an aromatic group which may contain a substituent group, a linear or branched alkyl group of 1 to 10 carbon atoms which may contain a substituent group, or a linear or branched alkenyl group of 2 to 10 carbon atoms which may contain a substituent group;
• n represents an integer of 0 or 1;
• Y1 represents an alkylene group of 1 to 4 carbon atoms in which hydrogen atoms may be substituted with fluorine atoms;
• M+ represents an alkali metal ion;
• R1 each independently represents an aryl group or alkyl group which may contain a substituent group;
• and R7 represents an alkyl group or a fluorinated alkyl group.).