Membrane Structure and Method for Manufacturing the Same
AssigneeTokyo Electron Limited
InventorsMasato Hayashi, Msanori Yamaguchi, Yohei Yamada, Jun Murase, Katsuyuki Ono, Naoyuki Satoh
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AssigneeTokyo Electron Limited
InventorsMasato Hayashi, Msanori Yamaguchi, Yohei Yamada, Jun Murase, Katsuyuki Ono, Naoyuki Satoh
Estimating the term…
The present invention provides a membrane structure having favorable pressure resistance and a manufacturing method of the same. After forming an opening (21a) on a substrate (21) by Deep Digging Reactive Ion Etching (DRIE), vertical streak formed by DRIE on the side face (inner peripheral face) of the opening (21a) is removed by performing light etching with an alkali etchant. The level of overhang of an overhanging section (21b) formed when forming an opening (22a) of a BOX layer (22) is suppressed by suppressing the overetching level when forming the BOX layer (22) by etching.
A membrane structure comprising;
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A manufacturing method of a membrane structure comprising the steps of;
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Dependencies are inferred from the claim text.