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OwnerRikizo Hatakeyama, Kuniyoshi Yokoo +3inventors
InventorsRikizo Hatakeyama, Kuniyoshi Yokoo, Takamichi Hirata, Yasuhiko Kasama, Kenji Omote
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A device and a method capable of producing induction fullerene with high yield are provided. Nitrogen gas being an object to be induced is introduced into a plasma flow producing chamber and a high-temperature flow forming chamber to form a high-temperature plasma flow consisting of nitrogen ions and electrons. A negative voltage is applied to a grid 105 to keep low electron energy in the high-temperature plasma flow. Then by making electrons collide with fullerene introduced from a fullerene sublimating oven 107, electrons are bonded to the fullerene and thereby the fullerene is ionized. A recovering cylinder 112 is disposed in an induction fullerene accumulating chamber so as to enclose a plasma flow. In this fullerene accumulating chamber, induction fullerene such as nitrogen-substitution hetero fullerene and nitrogen-included fullerene is produced and deposited in the recovering chamber 112.
An induction fullerene producing device, characterized by having a plasma flow producing chamber for producing a plasma flow containing an object to be induced, a fullerene introducing portion which is disposed at the downstream side of said plasma flow producing chamber and introduces fullerene into a plasma flow, and an induction fullerene accumulating chamber having a recovering cylinder disposed so as to enclose a plasma flow at the downstream side of said fullerene introducing portion.
An induction fullerene producing device, characterized by having a plasma flow producing chamber for producing a plasma flow containing an object to be induced, a high-temperature plasma flow forming chamber for forming a high-temperature plasma flow from said plasma flow, a fullerene introducing portion for introducing fullerene into said high-temperature plasma flow forming chamber, and an induction fullerene accumulating chamber having a recovering cylinder disposed so as to enclose a plasma flow at the downstream side of said high-temperature plasma flow forming chamber.
An induction fullerene producing method, characterized by having a process of producing a plasma flow from an object to be induced and a process of producing induction fullerene by introducing fullerene into said plasma flow and accumulating said induction fullerene in a recovering cylinder disposed so as to enclose the plasma flow.
Dependencies are inferred from the claim text.